Chiral surface formation of copper films by magnetoelectrochemical etching

I. Mogi¹ - R. Aogaki² - K. Watanabe¹

¹ Institute for Materials Research, Tohoku University, Katahira, Sendai 980-8577, Japan
² Polytechnic University, Sagamihara, Kanagawa 252-5196, Japan

Abstract
Formation of a chiral surface was investigated in magnetoelectrochemical etching (MEE). The MEE of copper films was conducted in galvanostatic conditions with various etching currents in a magnetic field of 5 T perpendicular to the electrode surfaces. The MEE film electrodes exhibited a current difference in voltammograms between alanine enantiomers, and such chiral behavior depended on the etching current and magnetic field polarity at the MEE processes. Figs 6, Refs 19.