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Chiral surface formation of copper films by magnetoelectrochemical etching

I. Mogi1 - R. Aogaki2 - K. Watanabe1

1 Institute for Materials Research, Tohoku University, Katahira, Sendai 980-8577, Japan
2 Polytechnic University, Sagamihara, Kanagawa 252-5196, Japan

Formation of a chiral surface was investigated in magnetoelectrochemical etching (MEE). The MEE of copper films was conducted in galvanostatic conditions with various etching currents in a magnetic field of 5 T perpendicular to the electrode surfaces. The MEE film electrodes exhibited a current difference in voltammograms between alanine enantiomers, and such chiral behavior depended on the etching current and magnetic field polarity at the MEE processes. Figs 6, Refs 19.

Magnetohydrodynamics 51, No. 2, 361-368, 2015 [PDF, 0.76 Mb]

Copyright: Institute of Physics, University of Latvia
Electronic edition ISSN 1574-0579
Printed edition ISSN 0024-998X