Electromagnetic flow control in the Ribbon Growth on Substrate process

P. Beckstein - V. Galindo - G. Gerbeth

Helmholtz-Zentrum Dresden -- Rossendorf (HZDR), Bautzner Landstrasse 400, 01328 Dresden, Germany

Abstract
The Ribbon Growth on Substrate (RGS) technology promises a very efficient approach for future photovoltaic (PV) silicon wafer production compared to the majority of commonly accepted processes. Although, for an eventual break-through of this RGS technology a number of remaining problems need to be addressed to increase the process stability. We have, therefore, performed numerical investigations in order to study the influence of the involved AC magnetic fields on the silicon melt flow during the RGS process. Tables 1, Figs 7, Refs 33.