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Magnetic and electric field assisted polishing for the control of the distribution of abrasives
N. Umehara1 - T. Kusumi2 - Y. Akagami2
1 Nagoya University, B3-3-641, Furo-cho, Chikusa-ku, Nagoya, 464-8603 Japan
2 Akita Industrial Technology Center, 4-11, Araya, Akita 010-1623, Japan
Abstract
We tried to apply a magnetic force with a magnetic fluid and a magnetic field for uniform distribution of abrasives during the polishing process. Also an electric field was applied to polish and showed a high removal rate after being used for a long polishing time. Figs 3, Refs 5.